Silicides : fundamentals and applications ; proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999

Introduction to 'Silicides: Fundamentals and Applications'

Welcome to a thorough exploration of the remarkable world of silicides, where science meets practical application. This book is a compilation of knowledge, insights, and research findings from the 16th Course of the International School of Solid State Physics, held in Erice, Italy, from June 5-16, 1999. Edited by Francois D’Heurle and Leo Miglio, it aims to present both fundamental and applied aspects of silicides to a diverse audience comprising academics, researchers, and industry professionals.

Detailed Summary of the Book

Covering the broad spectrum of silicides, this book delves into aspects that range from their fundamental properties to their extensive applications across various industries. Silicides, compounds consisting of silicon and more electropositive elements, play a crucial role in semiconductor technology and other advanced fields. This book is structured to provide theoretical foundations alongside practical insights into manufacturing, characterization, and emergent applications.

Topics addressed include the various methods of silicide production, characterization of their structural and electronic properties, and insights into their interactions with other materials. It also explores cutting-edge applications of silicides in electronics, including their use as contact materials in microelectronic devices, addressing both challenges and innovative solutions.

Key Takeaways

• Understanding Silicides: Gain a comprehensive understanding of the different types of silicides, their formation, and their physicochemical properties.
• Materials Science Insights: Learn about the complex interactions and properties that make silicides valuable for a wide range of scientific and industrial applications.
• Innovative Applications: Discover the latest research and emerging trends in the use of silicides in semiconductor technology and other fields.
• Research Integration: Analyze insights from leading experts that integrate theoretical knowledge with practical applications, enabling the development of new technologies.

Famous Quotes from the Book

"Silicides, through their unique electrical and thermal properties, bridge the gap between silicon-based and metal-based technologies, offering unparalleled advantages in device miniaturization."

"Exploring the interface dynamics of silicides presents both a challenge and an opportunity to push the boundaries of what is technologically possible."

Why This Book Matters

This book stands as a significant contribution to the field of material science and solid-state physics. It not only serves as a valuable academic resource for understanding the properties and applications of silicides but also acts as a bridge connecting fundamental research with industrial innovation. Whether you are a student delving into materials science, a researcher looking to deepen your understanding of silicide applications, or an industry practitioner aiming to implement the latest technologies, this book provides the essential knowledge and insights.

The proceedings presented here capture a pivotal moment in the late 20th century when silicides began to gain significant traction in technology and industry. They offer a blend of historical perspective and forward-looking vision, making them relevant even in today's rapidly evolving technological landscape.

Moreover, the contributions from notable scientists and technologists enrich the reader's comprehension and appreciation of the dynamic nature of silicide research and applications. The multi-disciplinary approach ensures that this book remains a crucial reference point for multiple generations of scientists and engineers.